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五靶磁控溅射沉积

发布日期:2015/6/10 19:37:23

五靶磁控溅射沉积

德国于立希研究所研发的五靶头磁控溅射沉积系统:

1.  沉积温度:900度;

2.   真空系统低于 1*10-4帕;

3.   靶间平行互动,可用于多层膜的制备;


代表性文章:

1.Z. X. Sun, C. R. Ma, M. Liu,* J. Cui, L. Lu, J. B. Lu, X. J. Lou, L. Jin, H. Wang,* C. L. Jia. "Ultrahigh Energy Storage Performance of Lead-Free Multilayer Film Capacitors via Interface Engineering`", Advanced Materials, 29: 1604427, 2017.

2.Zixiong Sun, Chunrui Ma,* Xi Wang, Ming Liu,* Lu Lu, Ming Wu, Xiaojie Lou, Hong Wang, Chun-Lin Jia. "Large Energy Density, Excellent Thermal Stability and High Cycling Endurance of Lead-Free BaZr0.2Ti0.8O3 Film Capacitors". ACS Applied Materials & Interfaces, 9: 17096-17101, 2017.

3.R. Y. Zhang, M. Liu,* L. Lu, S. B. Mi, H. Wang,* "Strain-Tunable Magnetic Properties of Epitaxial Lithium Ferrite Thin Films on MaAl2O4 Substrates", J. Mater. Chem. C, 3: 5598-5602, 2015. (封底发表) 

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